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Spreading resistance profiling : ウィキペディア英語版
Spreading resistance profiling

Spreading resistance profiling (SRP), also known as spreading resistance analysis (SRA), is a technique used to analyze resistivity versus depth in semiconductors. Semiconductor devices depend on the distribution of carriers (electrons or holes) within their structures to provide the desired performance. The carrier concentration (which can vary by up to ten orders of magnitude) can be inferred from the resistivity profile provided by SRP.
== History ==
The fundamental relationship is usually attributed to James Clerk Maxwell (1831–1879). In 1962, Mazur (US Patent 3,628,137) and Dickey〔D. H. Dickey, The Electrochem. Soc., Electron. Div Ext. Abstr. 12, 151 (1963)〕 developed a practical 2-probe system using a pair of weighted osmium needles.
In 1970, Solid State Measurements was founded to manufacture spreading resistance profiling tools and in 1974, Solecon Labs was founded to provide spreading resistance profiling services. In 1980, Dickey developed a practical method of determining p- or n-type using the spreading resistance tool. Improvements have continued but have been challenged by the ever shrinking dimensions of state-of-the-art digital devices. For shallow structures (<1 um deep), the data reduction is complex. Some of the contributors to the data reduction are Dickey,〔D. H. Dickey and J. R. Ehrstein, NBS Special Publication 400-48, (1979)〕〔D. H. Dickey, ASTM Subcommittee F1.06 Meeting, Denver, June 1984〕 Schumann and Gardner,〔P. A. Schumann and E. E. Gardner, J. Electrochem. Soc. 116, 87 (1969)〕 Choo ''et al.'',〔S. C. Choo, M. S. Leong, and K.L. Hong, L. Li and L. S. Tan, Solid State Electronics, 21, 796 (1978)〕 Berkowitz and Lux,〔H. L. Berkowitz and R. A. Lux, J. Electrochem Soc. 128, 1137 (1981)〕 Evans and Donovan,〔R. A. Evans and R. P. Donovan, Solid St. Electron. 10, 155 (1967)
〕 Peissens ''et al.'',〔R. Peissens, W. B. Vandervorst, and H. E. Maes, J. Electrochemical Soc. 130, 468 (1983).〕 Hu,〔S. M. Hu, J. Appl. Phys. 53, 1499 (1982)〕 Albers,〔J. H. Albers, ''Emerging Semiconductor Technology'', ASTM ATP 960, D. C. Gupta and P. H. Langer, Eds., Am. Soc. for Testing and Materials (1986).〕 and Casel and Jorke.〔A. Casel and H. Jorke, Appl. Phys. Lett., 50, 989 (1987)〕

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